publication
IEEE/CAA Journal of Automatica Sinica,刊名中文《自動(dòng)化學(xué)報(bào)》(英文版),創(chuàng)刊于2014年,由中國(guó)自動(dòng)化學(xué)會(huì)、中國(guó)科學(xué)院自動(dòng)化研究所主辦,與IEEE合作辦刊,報(bào)道自動(dòng)化領(lǐng)域熱點(diǎn)前沿研究成果。
IEEE/CAA Journal of Automatica Sinica被SCI,,EI,Scopus,DBLP等數(shù)據(jù)庫(kù)收錄,入選中國(guó)科技期刊卓越行動(dòng)計(jì)劃世界一流重點(diǎn)建設(shè)期刊、中國(guó)科協(xié)自動(dòng)化領(lǐng)域T1級(jí)高質(zhì)量科技期刊、計(jì)算領(lǐng)域高質(zhì)量科技期刊T1類(lèi)(最頂級(jí))、中國(guó)科技核心期刊、ESI刊源期刊,自首次參評(píng)以來(lái)已連續(xù)五年榮獲“中國(guó)最具國(guó)際影響力學(xué)術(shù)期刊”稱(chēng)號(hào)(Top5%)。
IEEE/CAA Journal of Automatica Sinica是中科院期刊分區(qū)工程技術(shù)和計(jì)算機(jī)科學(xué)類(lèi)一區(qū)Top期刊;2021年SCI影響因子7.847,在自動(dòng)化與控制領(lǐng)域排名全球第7(前10%),是該領(lǐng)域唯一的中國(guó)主辦Q1區(qū)SCI期刊;2021年CiteScore為13.0,在控制與優(yōu)化領(lǐng)域排名全球第1,在計(jì)算機(jī)信息系統(tǒng)、控制與系統(tǒng)工程、人工智能領(lǐng)域分別排名前5%-7%,均位于Q1區(qū)前列,;全球TOP1000期刊榜單計(jì)算機(jī)與電子領(lǐng)域排名世界前12%、中國(guó)第1;谷歌學(xué)術(shù)計(jì)量自動(dòng)化與控制理論學(xué)科頂級(jí)出版物中排名全球第7,是該學(xué)科TOP20出版物中世界最年輕且唯一中國(guó)主辦的期刊。
期刊主頁(yè):http://www.ieee-jas.net
在線(xiàn)投稿:https://mc03.manuscriptcentral.com/ieee-jas
編委會(huì):https://www.ieee-jas.net/news/Current.htm
聯(lián)系方式
聯(lián)系人:歐彥
電話(huà):010-82544459
email:yan.ou@ia.ac.cn
主編
Qing-Long Han Swinburne University of Technology, Australia
副主編
Derong Liu Guangdong University of Technology, China
Zhongping Jiang New York University, USA
Qinglai Wei Chinese Academy of Sciences, China
編委
Cesare Alippi Politecnico di Milano, Italy
Panos J. Antsaklis University of Notre Dame, USA
Tamer Basar University of Illinois, USA
Dimitri P. Bertsekas Massachusetts Institute of Technology, USA
Bijnan Bandyopadhyay Indian Institute of Technology Bombay, India
Zhengcai Cao Beijing University of Chemical Technology, China
Long Chen University of Macau, Macau
C. L. Philip Chen University of Macau, Macau
Mo-Yuen Chow Shanghai Jiaotong University, China
L. Chen Sun Yat-sen University, China
Weiping Ding Nantong University, China
Daoyi Dong University of New South Wales, Australia
Giuseppe Franzè University of Calabria, Italy
Shangce Gao University of Toyama, Japan
Weinan Gao Florida Institute of Technology, USA
Fengling Han Royal Melbourne Institute of Technology, Australia
Wei He University of Science & Technology Beijing, China
Zengguang Hou Chinese Academy of Sciences, China
Tingwen Huang Texas A&M University at Qatar, Qatar
Biao Huang University of Alberta, Canada
Frank L. Lewis The University of Texas at Arlington, USA
Hongyi Li Guangdong University of Technology, China
Shuai Li Swansea University, UK
Chenglin Liu Chinese Academy of Sciences, China
Honghai Liu University of Portsmouth, UK
Lichuan Liu Northern Illinois University, USA
Xiaoping Liu Carleton University, Canada
Yan-Jun Liu Liaoning University of Technology, China
Xin Luo Chinese Academy of Sciences, China
Yan Lu NIST, USA
Antonio Marcus Nogueira Lima Universidade Federal de Campina Grande, Brazil
Xiaoxiang Na University of Cambridge, UK
Thomas Parisini University of Trieste, Italy
Marios M. Polycarpou University of Cyprus, Cyprus
Xuemin Shen University of Waterloo, Canada
Jinhua She Tokyo University of Technology, Japan
Lei Shu University of Lincoln, UK
Zhen Song Siemens Corporation, USA
Fei-Yue Wang Chinese Academy of Sciences, China
Jiacun Wang Monmouth University, USA
Shouguang Wang Zhejiang Gongshang University, China
Zidong Wang Brunel University London, UK
Donald C. Wunsch II Missouri University of Science and Technology, USA
Yang Xiang Swinburne University of Technology, Australia
Peter Xiong Microsoft, USA
Tao Yang Northeastern University, China
Hui Yu Pouthmoth University, UK
Huaguang Zhang Northeastern University, China
Jun Zhang Denver University, USA
Nian Zhang University of the District of Columbia, USA
Jinyun Zhang Mitsubishi Electric Research Laboratories, USA
Mengchu Zhou New Jersey Institute of Technology, USA